Semiconductor & Cleanroom Manufacturing Air Filtration

Even Tiny Amounts of the Wrong Gas Can Ruin a Batch

In semiconductor manufacturing, the threat isn't visible dust, it's gases at levels too small to see or smell.

These are called airborne molecular contaminants, and they include acids, bases, and VOCs that can come from cleaning chemicals, outside air, construction materials, or even the people working in the cleanroom. At the concentrations semiconductor work requires, even trace amounts of these gases can affect a wafer's surface and cause defects. Standard particle filters, including HEPA, don't remove these gases at all, they only catch solid particles.

Clues That Gas Contamination Is Costing You Yield

• Product yield issues can't be traced to particle contamination

• Your cleanroom uses outside air without gas-phase filtration

• You're running more sensitive process nodes than before

• Cleanroom classification hasn't been checked in a while

• New construction or renovation is happening nearby

• You've never tested for airborne molecular contamination

Chemical Filtration for Semiconductor Cleanrooms 

Electrocorp's chemical filtration uses specialty carbon and media designed to target the specific acids, bases, and VOCs that threaten semiconductor processes. This runs alongside standard HEPA filtration, since particle control and gas control are two separate jobs that both need to happen. Systems can be built into makeup air units or added directly into the cleanroom's air handling path.